Frequency tuning for dual level radio frequency (RF) pulsing

ABSTRACT

Methods and apparatus for frequency tuning in process chambers using dual level pulsed power are provided herein. In some embodiments, a method for frequency tuning may include providing a first pulsed power at a first frequency while the first frequency is adjusted to a second frequency, wherein the first frequency is a last known tuned frequency at the first pulsed power, storing the second frequency as the last known tuned frequency at the first pulsed power, providing a second pulsed power at a third frequency while the third frequency is adjusted to a fourth frequency, wherein the first pulsed power and the second pulsed power are different and non-zero, and wherein the third frequency is a last known tuned frequency at the second pulsed power, and storing the fourth frequency as the last known tuned frequency at the second pulsed power.

CROSS-REFERENCE TO RELATED APPLICATIONS

This application claims benefit of U.S. provisional patent applicationSer. No. 61/902,396, filed Nov. 11, 2013, which is herein incorporatedby reference in its entirety.

FIELD

Embodiments of the present disclosure generally relate to semiconductorprocessing and, more specifically, to methods and apparatus forfrequency tuning in process chambers using a pulsed plasma.

BACKGROUND

In semiconductor integrated circuit (IC) fabrication, devices such ascomponent transistors are formed on a semiconductor substrate. Duringthe fabrication process, various materials are deposited or etched ondifferent layers in order to build or form the desired integratedcircuit. The various layers define devices that are interconnected bymetallization lines. During certain plasma enhanced processes performedupon substrates that already contain devices and metalized lines, asubstantial amount of charge may accumulate on the surface of thesubstrate. This charge accumulation may not be uniform across thesubstrate may cause destructive currents to be induced the metalizedmaterials and/or cause arcing within or across dielectric layers. Thecurrents and/or arcing may destroy or damage devices that havepreviously been formed on the substrate. To mitigate the chargingeffects and avoid charging damage, the power supplied to a plasma withina plasma enhanced reactor may be pulsed during all or part of the plasmaprocess.

When pulsing the plasma, the power from a radio frequency (RF) powersource may be coupled through a dynamically tuned matching network (alsoreferred to as a match unit) to an antenna or electrode within thereactor. The pulsed power is coupled from the antenna or electrode toprocess gases within the reactor to form a plasma that is used for theetching process. The matching network ensures that the output of the RFsource is efficiently coupled to the plasma to maximize the amount ofenergy coupled to the plasma (e.g., referred to as tuning the RF powerdelivery). Thus, the matching network ensures that the total impedance(i.e., plasma impedance+chamber impedance+matching network impedance) isthe same as the output impedance of the RF power delivery.

In continuous wave and single level pulsing (e.g., pulsing between an onstate and an off state), there is only one state to tune to (e.g., theon state). However, in dual level pulsing, the RF power source isswitched between a high state and a low state (e.g., not an off state),at a pulse frequency and a pulse duty cycle. Thus, the RF powerdelivered alternates between two different on states that have to betuned to. However, due to the high frequency at which the different onstates are provided during dual level pulsing processes, tuning withvariable capacitors is not possible due to the low speed of variablecapacitor movements.

In view of the foregoing, the inventors have provided embodiments ofimproved methods and apparatus for frequency tuning in process chambersusing dual level pulsed RF power.

SUMMARY

Methods and apparatus for frequency tuning in process chambers usingdual level pulsed power are provided herein. In some embodiments, amethod for frequency tuning may include providing a first pulsed powerat a first frequency by an RF power source for a first period of timewhile the first frequency is adjusted to a second frequency to achieve adesired impedance at the first pulsed power between the RF power sourceand a load, wherein the first frequency is a last known tuned frequencyat the first pulsed power, storing the second frequency as the lastknown tuned frequency at the first pulsed power, providing a secondpulsed power at a third frequency by the RF power source for a secondperiod of time while the third frequency is adjusted to a fourthfrequency to achieve a desired impedance at the second pulsed powerbetween the RF power source and the load, wherein the first pulsed powerand the second pulsed power are different and non-zero, and wherein thethird frequency is a last known tuned frequency at the second pulsedpower, and storing the fourth frequency as the last known tunedfrequency at the second pulsed power.

In some embodiments, a method for frequency tuning in process chambersusing dual level pulsed power may include alternately providing RFenergy to a plasma in a process chamber at a first power level and asecond power level, wherein the first and second power levels aredifferent and non-zero, wherein the RF energy provided at the firstpower level has a first frequency and is provided for a first period oftime, wherein the RF energy provided at the second power level has asecond frequency and is provided for a second period of time, tuning thefirst frequency of the RF energy during the first period of time and thesecond frequency of the RF energy during the second period of time toreduce a reflected power of the RF energy and storing a last known tunedvalue of the first frequency and the second frequency, and whenswitching between power levels, setting an initial frequency of the RFenergy to the last known tuned value of the first frequency or thesecond frequency.

In some embodiments, a method for frequency tuning in process chambersusing dual level pulsed power may include providing RF energy having afirst frequency and a first power level for a first period of time to aplasma formed in a process chamber, wherein the first power level isnon-zero, during the first period, tuning the first frequency to a firsttuned frequency to minimize RF power reflected from the plasma,subsequently providing RF energy having a second frequency and a secondpower level for a second period to the plasma, wherein the second powerlevel is non-zero and different than that first power level, during thesecond period, tuning the second frequency to minimize RF powerreflected from the plasma, and subsequently providing RF energy havingthe first tuned frequency and the first power level for a third periodto the plasma.

Other and further embodiments of the present disclosure are describedbelow.

BRIEF DESCRIPTION OF THE DRAWINGS

Embodiments of the present disclosure, briefly summarized above anddiscussed in greater detail below, can be understood by reference to theillustrative embodiments of the disclosure depicted in the appendeddrawings. It is to be noted, however, that the appended drawingsillustrate only typical embodiments of this disclosure and are not to beconsidered limiting of its scope, for the disclosure may admit to otherequally effective embodiments.

FIG. 1 depicts a method for frequency tuning in process chambers usingdual level pulsed power in accordance with some embodiments of thepresent disclosure.

FIG. 2 depicts a graph showing power level and frequency over time forthe inventive method for dual frequency tuning in dual level pulsing ina process chamber in accordance with some embodiments of the presentdisclosure.

FIG. 3 depicts a process chamber suitable to perform a method forfrequency tuning in process chambers using dual level pulsed power inaccordance with some embodiments of the present disclosure.

To facilitate understanding, identical reference numerals have beenused, where possible, to designate identical elements that are common tothe figures. The figures are not drawn to scale and may be simplifiedfor clarity. It is contemplated that elements and features of oneembodiment may be beneficially incorporated in other embodiments withoutfurther recitation.

DETAILED DESCRIPTION

Embodiments of the present disclosure provide methods and apparatus foroperating a plasma enhanced substrate processing system using dual levelpulsed radio frequency (RF) power. More specifically, embodiments of thepresent disclosure allow for frequency tuning in process chambers usingdual level pulsed power, which yields a dual plasma condition (e.g., twodifferent plasma on states) which is useful for plasma processing ofsubstrates, for example, in thin-film processing and microelectronicdevice fabrication. In some embodiments, the inventive methods mayadvantageously provide methods for fast frequency tuning between twoplasma on states. As used herein, tuning refers to the process ofvarying (e.g., tuning) the impedance of the electrical pathway seen bythe RF source (i.e., plasma impedance+chamber impedance+matching networkimpedance) in order to minimize power reflected back to the RF powersource from the plasma and maximize efficient coupling of power from theRF power source to the plasma.

The inventors have observed that conventional tuning using a variablecapacitor in a matching network for dual level pulsing is too slow dueto the slow speed of movement of the variable capacitor in the matchingnetwork. In addition, although frequency tuning for dual level pulsingmay be sufficiently fast, the inventors have observed that conventionalmethodologies of letting the RF power source tune with frequency tuningat every state change (from a high state to a low state, or from a lowstate to a high state) is not sufficient to have good and reliabletuning.

Accordingly, the inventors have provided methods to achieve improvedtuning in dual level pulsing processes. FIG. 1 depicts a method 100 forfrequency tuning in process chambers using dual level pulsed powerprocesses in accordance with some embodiments of the present disclosure.The inventive methods may be utilized in conjunction with any type ofprocess chamber utilizing RF power having a variable frequency and duallevel pulsing provided by an RF power source, for example, such as theprocess chamber 310 and RF power source 318 described below with respectto FIG. 3. The method 100 is described in conjunction with the power andfrequency timing diagrams of FIG. 2.

During processing, the RF power source 318 provides two different,non-zero pulsed power levels, a high power level state (p_high) and alow power level state (p_low). During dual level pulsing, the RF powersource 318 will alternate providing power at the two distinct powerlevels, p_high and p_low, at discrete time intervals, as shown in FIG.2, for example, p_high 202 at t1, p_low 204 at t2, p_high 202 at t3,p_low 204 at t4, etc. The length of each time period that p_low andp_high are applied may be about 10 microseconds to about 1 second. Thetime periods for p_low and p_high are typically the same length,however, in some embodiments, the p_low may be applied for a differentlength of time than p_high. In some embodiments, the RF power source318, or a controller associated with RF power source 318, tracks twotuning conditions with two frequencies (f_high and f_low). In effect,the frequency tuner of the RF power source 318 is provided with thepower level state of the RF power source 318, so that the RF powersource 318 can move to the frequency corresponding to the state (f_highfor high state p_high, or f_low for low state p_low). It should beunderstood to those skilled in the art that the designation of f_highand f_low pertains to the frequency associated with the p_high state andp_low state, respectively, and does not imply that the frequency atf_high is greater than the frequency of f_low. For example, in someembodiments, the magnitude of the frequency at f_high may be greaterthan f_low, less than f_low, or equal to f_low.

In some embodiments, the pulse frequency may be about 1 Hz to about 50kHz. The pulse frequency for dual level pulsing is defined as the numberof times a pulsed activity (p_high+p_low) occurs every second. The dutycycle for each state in a dual level pulsing system is the percent oftime that the RF power supply provides power at the particular state asa fraction of the total time under consideration. That is, the dutycycle for p_high is the time p_high is applied (p_high ON-time) dividedby the total time that one cycle of p_high and p_low are applied (p_highON-time +p_low ON-time). In some embodiments, p_high ON-time may be lessthan, greater than, or equal to p_low ON-time. As such, in embodimentsconsistent with the present disclosure, the duty cycle for each statemay be from about 1% to about 99%. A 50% duty cycle would indicate thateach state applied for the same amount of time.

In some embodiments, the power levels of the high pulsed power state maybe about 5 watts to about 20 kilowatts. Similarly, the power levels ofthe low pulsed power state may also be about 5 watts to about 20kilowatts, although p_low will be lower than p_high for a given process.Although described herein as a dual level pulsing between two RF powerstates, in the embodiments described herein, the levels of RF powerprovided may be more than two different power states (i.e., amulti-level pulsed power provided to the process chamber). For anN-level pulsed power, a pulse frequency and (N−1) duty cycles, or NON-times would be used.

The method 100 generally begins at 102 where a first pulsed RF power isprovided to the process chamber by an RF power source, such as RF powersource 318. The first RF power is one of two different power states(p_high or p_low) of a dual level pulsed power provided to the processchamber. A first frequency may be associated with the first pulsed RFpower. In some embodiments, the first frequency may have been stored asthe last known tuned frequency at the first RF power. That is, in orderto provide fast frequency tuning, a frequency tuner, such as for examplefrequency tuner 360 in FIG. 3 in the RF power source 318, is providedwith the frequency that achieved a desired impedance at the first pulsedRF power between the RF power source and a load (e.g., the plasma). Forexample, as shown in FIG. 2, if the first RF pulsed power is a highpower state, (e.g., p_high 202 at t3), the frequency at which the system300 was tuned the last time it was at p_high (i.e., frequency 210) willbe used as the first frequency (i.e., frequency 212) at which RF powerp_high is provided at t3. During initial operation, a last known tunedfrequency may not exist. Accordingly, an estimated or default value maybe used as the initial frequency for the first time period. The defaultinitial frequency set may depend in the chamber design.

At 104, the first frequency is adjusted to a second frequency to achievea new tuned state at the first pulsed RF power level (i.e., achieve adesired impedance at the first pulsed RF power between the RF powersource and a load). Specifically, although the first frequency isprovided at the last known tuned frequency, the system 300 may performadditional tuning to achieve the desired impedance match between the RFpower source and a load. In some embodiments, the first frequency may beadjusted to the second frequency to reduce a reflected power from the RFpower source to achieve a new tuned state of the system 300. Thereflected power is typically reduced to a target of about 0% of aforward power provided by the RF power source to achieve a tuned state.In some embodiments, an allowable band of reflected power may beconsidered a tuned state depending on the chamber design. In someembodiments, the frequency may be adjusted to the new tuned state usingthe frequency tuner 360 of the RF power source 318 at the first pulsedRF power. For example, with respect to FIG. 2, the first frequency 212may be adjusted by frequency tuner 360 to achieve a new tuned state atsecond frequency 214 at the high power state p_high 202.

Once the system 300 is tuned at 104 at the second frequency (e.g.,frequency 214 in FIG. 2), the second frequency is stored as the lastknown tuned frequency to be used the next time the RF power sourceprovide power at the first pulsed RF power state (e.g., p_high 216 att5) at 106. As used herein, storing the frequency includes storinginformation associated with the frequency, such as for example, storinga magnitude of the frequency in association with the corresponding powerlevel. The last known tuned frequency at the first power level may bestored by the RF power source, such as for example, in the memory 364 ofcontroller 362 of RF power source 318. In some embodiments, the lastknown tuned frequency at the first power level may be stored by acontroller associated with RF power source 318, such as for example, inmemory 342 of controller 340 and provided to the RF power source.

At 108, a second RF power is provided to the process chamber by the RFpower source at a third frequency, wherein the third frequency is a lastknown tuned frequency at the second RF power. For example, as shown inFIG. 2, a second RF power, p_low 204, which is different from the firstRF power, p_high, is applied at time t4 at a third frequency 252. Forexample, as shown in FIG. 2, if the second RF pulsed power is a lowpower state, (e.g., p_low 204 at t4), the frequency at which the system300 was tuned the last time it was at p_low (i.e., frequency 250) willbe used as the third frequency (i.e., frequency 252) at which RF powerp_low 204 is provided at t4.

At 110, the third frequency is adjusted to a fourth frequency to achievea new tuned state at the second pulsed RF power level (i.e., achieve adesired impedance at the second pulsed RF power between the RF powersource and a load). In some embodiments, the third frequency may beadjusted to the fourth frequency to reduce a reflected power from the RFpower source to achieve the new tuned state at the second RF power levelof the system 300. The reflected power is typically reduced to a targetof about 0% of a forward power provided by the RF power source toachieve a tuned state. In some embodiments, an allowable band ofreflected power may be considered a tuned state depending on the chamberdesign. The frequency may be adjusted to the new tuned state using thefrequency tuner 360 of the RF power source 318 at the second pulsed RFpower. For example, with respect to FIG. 2, the third frequency 252 maybe adjusted by frequency tuner 360 to achieve a new tuned state atfourth frequency 254 at the high power state p_low 204.

Once the system 300 is tuned at 110 at the fourth frequency (e.g.,frequency 254 in FIG. 2), the fourth frequency is stored as the lastknown tuned frequency to be used the next time the RF power sourceprovides power at the second pulsed RF power state (e.g., p_low 204) at112. As used herein, storing the frequency includes storing informationassociated with the frequency, such as for example, storing a magnitudeof the frequency in association with the corresponding power level. Thelast known tuned frequency at the second power level may be stored bythe RF power source, such as for example, in the memory 364 ofcontroller 362 of RF power source 318. In some embodiments, the lastknown tuned frequency at the first power level may be stored by acontroller associated with RF power source 318, such as for example, inmemory 342 of controller 340 and provided to the RF power source.

In some embodiments, at the transition from one power level state to theother, there should be a hold time, for example T_hold 256 in FIG. 2,during which the frequency is fixed at the last known good value toallow for: (1) changing the frequency to the new value and (2) leavingtime for the plasma to adapt to the new condition. This fixed timeoutdictates the highest pulsing frequency/pulsing duty cycle that can beused as the minimum ON-time (for duty cycles<50%) or OFF time (for dutycycles>50%) of the pulse needs to be greater than the timeout. That is,T_hold 256 determines the minimum ON-time for each sate(T_hold<ON-time). The value of T_hold is dependent on the RF generatorand chamber design.

The inventive methods may be utilized in conjunction with any type ofprocess chamber utilizing bias power having single or multiplefrequencies. Exemplary process chambers include any process chamber usedfor etching processes, for example, such as the ADVANTEDGE™, or otherprocess chambers, available from Applied Materials, Inc. of Santa Clara,Calif. Other process chambers, including those from other manufacturers,may similarly be used.

For example, FIG. 3 depicts a schematic diagram of an illustrativesystem 300 of the kind that may be used to practice embodiments of thedisclosure as discussed herein. The process chamber 310 of system 300may be utilized alone or as a processing module of an integratedsemiconductor substrate processing system, or cluster tool, such as aCENTURA® integrated semiconductor substrate processing system, availablefrom Applied Materials, Inc. of Santa Clara, Calif. Examples of suitableetch reactors include the ADVANTEDGE™ line of etch reactors (such as theAdvantEdge G3 or the AdvantEdge G5), the DPS® line of etch reactors(such as the DPS®, DPS® II, DPS® AE, DPS® HT, DPS® G3 poly etcher), orother etch reactors, also available from Applied Materials, Inc. Otherprocess chambers and/or cluster tools may suitably be used as well.

The system 300 generally comprises a process chamber 310 having asubstrate support (cathode) 316 within a conductive body (wall) 330, anda controller 340. The chamber 310 may be supplied with a substantiallyflat dielectric ceiling 320. Alternatively, the chamber 310 may haveother types of ceilings, e.g., a dome-shaped ceiling. An antennacomprising at least one inductive coil element 312 is disposed above theceiling 320 (two co-axial inductive coil elements 312 are shown).

The inductive coil element 312 is coupled to a RF plasma power source318 through a first matching network 319. The matching network 319 isheld during frequency tuning. In some embodiments, the matching network319 may be needed due to the different fixed positions that are neededfor different processes. In some embodiments, the RF power source 318may be capable of producing up to 3000 W at a tunable frequency in arange from about +/−5% to about +/−10% of the frequency generatoroutput. For example, a 13.56 MHz RF power source may produce a tunablefrequency in a range from about +/−5% to about +/−10% of 13.56 MHz. TheRF power source 318 may include an RF generator 366, a frequency tuner360, and a controller 362 that includes a memory 364 for storing thelast known tuned frequencies of a high power level state and a low powerlevel state. In some embodiments, the RF power source 318 may becontrolled by controller 340. In some embodiments, the pulse frequencyshould be less than the RF frequency, and both the p_high ON-time andp_low ON-time should be greater than the RF period.

The substrate support 316 may include an electrostatic chuck forretaining the substrate 314 and is coupled, through a second matchingnetwork 324 having a matching network output (cathode input) 325, to abiasing power source 322. In some embodiments, the biasing power source322 may be capable of producing up to 1500 W at a frequency ofapproximately 13.56 MHz. The biasing power may be either continuous orpulsed power. In some embodiments, the biasing power source 322 may be aDC or pulsed DC source. In some embodiments, a probe 327 may be disposedwithin the chamber 310 proximate the substrate support 316 to providemeasurements (e.g., the first DC voltage measurement of the substratedescribed above) within the process chamber 310. The probe 327 may befed out of the chamber 310 via a port 341 disposed in the wall 330 ofthe chamber 310. In some embodiments, a controller 329 may be coupled tothe probe 327 to facilitate recording or displaying the measurements ofthe probe 327.

The controller 340 generally comprises a central processing unit (CPU)344, a memory 342, and support circuits 346 for the CPU 344 andfacilitates control of the components of the chamber 310 and, as such,of the tuning process, as discussed above.

To facilitate control of the process chamber 310 as described above, thecontroller 340 may be one of any form of general-purpose computerprocessor that can be used in an industrial setting for controllingvarious chambers and sub-processors. The memory 342, orcomputer-readable medium, of the CPU 344 may be one or more of readilyavailable memory such as random access memory (RAM), read only memory(ROM), floppy disk, hard disk, or any other form of digital storage,local or remote. The support circuits 346 are coupled to the CPU 344 forsupporting the processor in a conventional manner. These circuitsinclude cache, power supplies, clock circuits, input/output circuitryand subsystems, and the like. The inventive methods described herein aregenerally stored in the memory 342 as a software routine. The softwareroutine may also be stored and/or executed by a second CPU (not shown)that is remotely located from the hardware being controlled by the CPU344.

In an exemplary operation of the system 300, a substrate 314 is placedon the substrate support 316 and process gases are supplied from a gaspanel 338 through entry ports 326 and form a gaseous mixture 350. Thegaseous mixture 350 is ignited into a plasma 355 in the chamber 310 byapplying power from the plasma power source 318 and biasing power source322 to the inductive coil element 312 and the cathode 316, respectively.The pressure within the interior of the chamber 310 is controlled usinga throttle valve 331 and a vacuum pump 336. Typically, the wall 330 iscoupled to an electrical ground 334. The temperature of the wall 330 maybe controlled using liquid-containing conduits (not shown) that runthrough the wall 330.

In some embodiments, the temperature of the substrate 314 may becontrolled by stabilizing a temperature of the substrate support 316. Insome embodiments, a gas from a gas source 348 is provided via a gasconduit 349 to channels (not shown) formed in the pedestal surface underthe substrate 314. The gas is used to facilitate heat transfer betweenthe substrate support 316 and the substrate 314. During processing, thesubstrate support 316 may be heated by a resistive heater (not shown)within the substrate support 316 to a steady state temperature and thenthe helium gas facilitates uniform heating of the substrate 314.

While the foregoing is directed to embodiments of the presentdisclosure, other and further embodiments of the disclosure may bedevised without departing from the basic scope thereof.

The invention claimed is:
 1. A method for frequency tuning in processchambers using dual level pulsed power, the method comprising: providinga first pulsed power at a first frequency by an RF power source for afirst period of time while the first frequency is adjusted to a secondfrequency to achieve a desired impedance at the first pulsed powerbetween the RF power source and a load, wherein the first frequency is alast known tuned frequency at the first pulsed power; storing the secondfrequency as the last known tuned frequency at the first pulsed power;providing a second pulsed power at a third frequency by the RF powersource for a second period of time while the third frequency is adjustedto a fourth frequency to achieve a desired impedance at the secondpulsed power between the RF power source and the load, wherein the firstpulsed power and the second pulsed power are different and non-zero, andwherein the third frequency is a last known tuned frequency at thesecond pulsed power; and storing the fourth frequency as the last knowntuned frequency at the second pulsed power.
 2. The method of claim 1,further comprising: providing the first pulsed power at the secondfrequency, which was stored as the last known tuned frequency at thefirst pulsed power, for a third period of time while the secondfrequency is adjusted to a fifth frequency to achieve the desiredimpedance at the first pulsed power between the RF power source and theload; and storing the fifth frequency as the last known tuned frequencyat the first pulsed power.
 3. The method of claim 1, wherein the lastknown tuned frequency at the first pulsed power and the last known tunedfrequency at the second pulsed power are stored in a memory of acontroller disposed in the RF power source.
 4. The method of claim 1,wherein the last known tuned frequency at the first pulsed power and thelast known tuned frequency at the second pulsed power are stored on acontroller that controls the RF power source.
 5. The method of claim 1,wherein the frequency of the first pulsed power is not adjusted until afirst predetermined hold time has expired.
 6. The method of claim 5,wherein the hold time is set to allow first pulsed power to reach thefirst frequency and to allow a plasma to adapt to the first pulsed powerand first frequency.
 7. The method of claim 1, wherein the frequency ofthe second pulsed power is not adjusted until a predetermined hold timehas expired.
 8. The method of claim 1, wherein adjusting the firstfrequency to the second frequency reduces a reflected power from the RFpower source during the first time period.
 9. The method of claim 8,wherein the reflected power is reduced to a target of about 0% of aforward power provided by the RF power source.
 10. The method of claim1, wherein adjusting the third frequency to the fourth frequency reducesa reflected power from the RF power source during the second timeperiod.
 11. The method of claim 10, wherein the reflected power isreduced to a target of about 0% of a forward power provided by the RFpower source.
 12. A method for processing a substrate using a dual levelpulsed radio frequency (RF) plasma, comprising: alternately providing RFenergy to a plasma in a process chamber at a first power level and asecond power level, wherein the first and second power levels aredifferent and non-zero, wherein the RF energy provided at the firstpower level has a first frequency and is provided for a first period oftime, wherein the RF energy provided at the second power level has asecond frequency and is provided for a second period of time; tuning thefirst frequency of the RF energy during the first period of time and thesecond frequency of the RF energy during the second period of time toreduce a reflected power of the RF energy and storing a last known tunedvalue of the first frequency and the second frequency; and whenswitching between power levels, setting an initial frequency of the RFenergy to the last known tuned value of the first frequency or thesecond frequency.
 13. The method of claim 12, wherein the RF energyprovided is from a single RF power source.
 14. The method of claim 13,wherein the last known tuned value of the first frequency and the lastknown tuned value at the of the second frequency are stored in a memoryof a controller disposed in the RF power source.
 15. The method of claim13, wherein the last known tuned value of the first frequency and thelast known tuned value at the of the second frequency are stored on acontroller that controls the RF power source.
 16. The method of claim12, wherein the first frequency is not tuned until a first predeterminedhold time has expired.
 17. The method of claim 16, wherein the hold timeis set to allow the RF energy provided at the first power level to reachthe first frequency and to allow a plasma to adapt to the RF energyprovided at the first power level and first frequency.
 18. The method ofclaim 12, wherein the second frequency is not tuned until apredetermined hold time has expired.
 19. The method of claim 18, whereinthe hold time is set to allow the RF energy provided at the second powerlevel to reach the second frequency and to allow a plasma to adapt tothe RF energy provided at the second power level and second frequency.20. A method for processing a substrate using a dual level pulsed radiofrequency (RF) plasma, comprising: providing RF energy having a firstfrequency and a first power level for a first period of time to a plasmaformed in a process chamber, wherein the first power level is non-zero;during the first period, tuning the first frequency to a first tunedfrequency to minimize RF power reflected from the plasma; subsequentlyproviding RF energy having a second frequency and a second power levelfor a second period to the plasma, wherein the second power level isnon-zero and different than that first power level; during the secondperiod, tuning the second frequency to minimize RF power reflected fromthe plasma; and subsequently providing RF energy having the first tunedfrequency and the first power level for a third period to the plasma.